Power Aware Design Methodologies by Jan M. Rabaey, Massoud Pedram

By Jan M. Rabaey, Massoud Pedram

Strength acutely aware layout Methodologies was once conceived as an attempt to convey all facets of power-aware layout methodologies jointly in one record. It covers numerous layers of the layout hierarchy from expertise, circuit good judgment, and architectural degrees as much as the procedure layer. It comprises dialogue of thoughts and methodologies for making improvements to the ability potency of CMOS circuits (digital and analog), structures on chip, microelectronic structures, wirelessly networked structures of computational nodes etc. as well as supplying an in-depth research of the resources of strength dissipation in VLSI circuits and structures and the expertise and layout tendencies, this booklet presents a myriad of state of the art methods to strength optimization and keep watch over. different chapters of energy acutely aware layout Methodologies were written via top researchers and specialists of their respective parts. Contributions are from either academia and undefined. The members have suggested some of the applied sciences, methodologies, and strategies in the sort of approach that they're comprehensible and necessary.

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Some of the problems associated with FD-SOI include the difficulty of controllably creating such thin layers of Si and difficulty in controlling the threshold voltage because it is now sensitive to the thickness of the Si layer and to possible trapped charge on the back interface. It is also difficult to achieve low resistance source and drain contacts to such thin Si layers, but it may be possible to overcome this problem through a raised source/drain process, as shown in the excellent results of [53].

The tunneling leakage current of these thin insulators has become a major concern for many applications. Devices are electrically separated by shallow trench isolation (STI), which involves etching trenches, filling them with deposited oxide and polishing the oxide to planarize. This process allows devices to be placed very close together, resulting in high circuit density. The source and drain consist of very shallow doping extensions under the gate edges and gate sidewalls, in combination with deeper implants under the contacts.

8(c) shows the minimum logic swing condition: the lowest and highest curves are exactly tangent at their intersection points (and the noise margin is exactly zero). Using this type of minimum logic swing condition, other logic families and fan-ins have also been evaluated, and the minimum supply voltage is found to vary roughly as ln(FI) for conventional devices in their exponential regime, where FI is the fan-in. Since the lowest voltage results occur for FETs in their subthreshold regime, where they present their Power-constained Scaling Limits 29 maximum, exponential nonlinearity, one would need devices with stronger nonlinearities to achieve smaller minimum logic swing.

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